JohnEkerdt
Surface and materials chemistry of metal and oxide thin films and hetero-structures; Film nucleation; Film growth by atomic layer deposition and film removal by atomic layer etching; Area-selective growth phenomena
About
Ekerdt’s early research explored the chemical vapor deposition growth chemistry of silicon-germanium and compound semiconductor crystalline thin films, silicon and germanium quantum dots on dielectric surfaces, and multimetallic nitride and carbide barrier films.
Ekerdt serves as interim dean for research. He previously served as chair of the chemical engineering department, as well as dean of the Cockrell School of Engineering.
Educational Qualifications
Ph.D., Chemical Engineering, University of California, Berkeley (1979)
B.S., Chemical Engineering, University of Wisconsin (1974)
Select Awards & Honors
- American Association for the Advancement of Science fellow (2012)
- American Society for Engineering Education Chemical Engineering Division Chemstations Award (2012)
- American Institute of Chemical Engineers (AIChE) fellow (2006)
- Joe J. King Professional Engineering Achievement Award – College of Engineering, The University of Texas (2005)
- Charles M. A. Stine Award in Materials Science and Engineering – American Institute of Chemical Engineers (2001)
- Teaching Award – McKetta Department of Chemical Engineering (1994)