Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films

by Maher, MJ (Maher, Michael J.); Rettner, CT (Rettner, Charles T.); Bates, CM (Bates, Christopher M.); Blachut, G (Blachut, Gregory); Carlson, MC (Carlson, Matthew C.); Durand, WJ (Durand, William J.); Ellison, CJ (Ellison, Christopher J.); Sanders, DP (Sanders, Daniel P.); Cheng, JY (Cheng, Joy Y.); Willson, CG (Willson, C. Grant)

ACS Applied Materials & Interfaces. 2015. 7(5), pp. 3323-3328

The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L-0 = 22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6x and trench space subdivisions up to 7 x, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.

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