Molecular Transfer Printing of Block Copolymer Patterns over Large Areas with Conformal Layers

by Takejiro Inoue, Dustin Janes, Jiaxing Ren, Hyo Seon Suh, Xuanxuan Chen, Christopher J. Ellison, and Paul Nealey

Advanced Materials Interfaces. 2015. 10.1002

Areal defect frequency in patterns formed by the directed self-assembly of block copolymers can likely be minimized by using 1:1 chemical nanopatterns. Here, a transfer printing technique is demonstrated by using conformal layers that generates continuous, sub-15 nm resolution, 1:1 chemical nanopatterns over large areas.

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